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01-27-2022 08:02 AM
Hi,
Working on refine a query. Here is the starting point.
match (a:cpc)
where a.art contains "ALD" or a.art contains 'atomic layer deposition'
return a.subgroup, a.art
Which returns this:
a.subgroup | a.art |
---|---|
C23C16/45525 | Atomic layer deposition [ALD] |
C23C16/45527 | characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations |
C23C16/45538 | Plasma being used continuously during the ALD cycle |
C23C16/4554 | Plasma being used non-continuously in between ALD reactions |
C23C16/45542 | Plasma being used non-continuously during the ALD reactions |
C23C16/45546 | specially adapted for a substrate stack in the ALD reactor |
C23C16/45548 | having arrangements for gas injection at different locations of the reactor for each ALD half-reaction |
C23C16/45553 | characterized by the use of precursors specially adapted for ALD |
G05B2219/49027 | SALD selective area laser deposition, vapor solidifies on surface |
H01J49/0418 | for laser desorption, e.g. matrix-assisted laser desorption/ionisation [MALDI], surface enhanced laser desorption/ionisation [SELDI] plates |
H01J49/164 | Laser desorption/ionisation, e.g. matrix-assisted laser desorption/ionisation [MALDI] |
H01L21/0228 | deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD |
H01L21/0229 | liquid atomic layer deposition |
H01L21/28194 | by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition |
H01L21/3141 | Deposition using atomic layer deposition techniques [ALD] |
H01L45/1616 | by chemical vapor deposition, e.g. MOCVD, ALD |
So far so good, now I want to further constrain the result to those where the subgroup starts with "H01L"
and started with this query.
MATCH (a:cpc) where a.supgroup starts with 'H01L' and a.art contains 'ALD' or a.art contains 'atomic layer deposition' return a.subgroup as subgroup
which return this list which seems to evaluate as the first "AND" last clause.
subgroup | a.art |
---|---|
H01L21/0229 | liquid atomic layer deposition |
H01L21/3141 | Deposition using atomic layer deposition techniques [ALD] |
If I try to put the two "contain" in parentheses since I want either to be true:
MATCH (a:cpc) where a.supgroup starts with 'H01L' and (a.art contains 'ALD' or a.art contains 'atomic layer deposition') return a.subgroup as subgroup
I get no results. What is the correct syntax that requires subgroup to start with "H01L" and have either of the contain clauses true to return a value. I am looking to get the last 5 rows of the first results table.
Andy
Solved! Go to Solution.
01-28-2022 12:36 AM
It seems just a typo
In the 1st query you write supgroup
, with P after su,
in the 2nd one instead is subgroup
.
01-27-2022 08:59 AM
Ok update though it needs some explaining.
I took the last query which yield no results
MATCH (a:cpc)
where a.supgroup starts with 'H01L' and (a.art contains 'ALD' or a.art contains 'atomic layer deposition')
return a.subgroup as subgroup
and just reversed the order of the clauses with the clauses in parenthesis now coming first
MATCH (a:cpc)
where (a.art contains 'ALD' or a.art contains 'atomic layer deposition') and a.subgroup starts with 'H01L'
return a.subgroup as subgroup, a.art
and that returns the desired result
subgroup | a.art |
---|---|
H01L21/0228 | deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD |
H01L21/0229 | liquid atomic layer deposition |
H01L21/28194 | by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition |
H01L21/3141 | Deposition using atomic layer deposition techniques [ALD] |
H01L45/1616 | by chemical vapor deposition, e.g. MOCVD, ALD |
So the question is why did the order matter?
Andy
01-28-2022 12:36 AM
It seems just a typo
In the 1st query you write supgroup
, with P after su,
in the 2nd one instead is subgroup
.
01-28-2022 05:48 AM
Thank you.
I was focusing on the second part of the test I didn't even see it.
Andy
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